Varian E500 EHP
- OEM: Varian
- OEM Part Number: E500
Description:
A 200mm Varian E500 high energy ion implanter, built on the E500 platform as an upgrade from the E220. The system delivers EHPi-500 class beam current and high energy operation while retaining the proven E220 lineage. It runs software version 15.10 revA under a Windows control system and ships with four configured gas box lines for production phosphorus, arsenic, and boron implants.The tool combines high beam current at conventional energies with genuine high energy operation up to 780 keV, suiting it to deep well, retrograde well, and high energy device applications. It carries a solid set of installed productivity and process assurance options.Key specificationsPlatform: Varian E500 (E220 upgrade), S/N ES293666U3Wafer sizes supported: 100mm, 125mm, 150mm, 200mmSoftware: 15.10 revA, Windows Control SystemEnergy range: standard operation through to high energy operation, 520 to 780 keVMaximum end station beam current (EHPi-500): up to 3300 µA (31P+), 2800 µA (75As+), 2000 µA (11B+/BF2+)Dose range: 1E11 to 1E16 ions/cm²Uniformity: 1σ ≤ 0.5%Repeatability: 1σ ≤ 0.5% (wafer to wafer)Beam parallelism: ≤0.5° (40 to 250 keV, drift or accel)Ion mass resolution: M/ΔM > 85 FWHMProcess angles: tilt 0 to 60° (±1°), orientation 0 to 360° (±2°)Throughput: 200mm at 210 wafers per hour (mechanical limit, 6 scans)Wafer breakage: MWBB ≤ 1:40,000Particulate control: ≤0.1 particles/cm² added at ≥0.16µmGas box configurationLine 1: SDS AsH3Line 2: SDS PH3Line 3: SDS BF3Line 4: ArgonInstalled optionsBeam Purity Check, Productivity Plus (PP+), Remote Recipe Editor, LX Productivity, Tilt Angle Assurance, Windows Control System, and Roplat Rotation Verification Interlock.Facilities (summary)75 kVA, 120/208V, 3 phase power (typical load 45 kVA); cooling water 60 to 150 PSIG; dry nitrogen and compressed air supply required. Footprint 96" H x 127.64" W x 197.33" D, weight 36,737 lbs (16,664 kg). Full facilities schedule available on request.
In Stock
