Varian E500 EHP
- OEM: Varian
- OEM Part Number: E500
Description:
Model: Varian E500 high energy ion implanter (E220 upgrade)
Serial No: ES293666U3
Overview: Built on the E500 platform as an upgrade from the E220, delivering EHPi-500 class beam current and high energy operation while retaining the proven E220 lineage. The tool combines high beam current at conventional energies with genuine high energy operation up to 780 keV, suiting it to deep well, retrograde well, and high energy device applications.
Software: 15.10 revA, Windows Control System
Key Specifications:
Wafer sizes supported: 100mm, 125mm, 150mm, 200mm
Energy range: 520 to 780 keV
Maximum end station beam current (EHPi-500):
Up to 3300 µA (31P+)
2800 µA (75As+)
2000 µA (11B+/BF2+)
Dose range: 1E11 to 1E16 ions/cm²
Uniformity: 1σ ≤ 0.5%
Repeatability: 1σ ≤ 0.5% (wafer to wafer)
Beam parallelism: ≤0.5° (40 to 250 keV, drift or accel)
Ion mass resolution: M/ΔM > 85 FWHM
Process angles: Tilt 0 to 60° (±1°), orientation 0 to 360° (±2°)
Throughput: 200mm at 210 wafers per hour (mechanical limit, 6 scans)
Wafer breakage: MWBB ≤ 1:40,000
Particulate control: ≤0.1 particles/cm² added at ≥0.16µm
Gas Box Configuration:
LineGasLine 1SDS AsH3Line 2SDS PH3Line 3SDS BF3Line 4Argon
Installed Options:
Beam Purity Check, Productivity Plus (PP+), Remote Recipe Editor, LX Productivity, Tilt Angle Assurance, Windows Control System, and Roplat Rotation Verification Interlock.
Facilities (summary):
Power: 75 kVA, 120/208V, 3 phase (typical load 45 kVA)
Cooling water: 60 to 150 PSIG
Utilities required: Dry nitrogen and compressed air supply
Footprint: 96" H x 127.64" W x 197.33" D
Weight: 36,737 lbs (16,664 kg)
Full facilities schedule available on request.
In Stock
