Varian E500 EHPI
- OEM: Varian
- OEM Part Number: E500
Description:
Varian E500 EHPI High Energy Ion ImplanterA 200mm Varian E500 EHPI (EHPi-500 platform) high energy ion implanter, configured for production phosphorus, arsenic, and boron implants across a wide energy and dose range. The system runs software version 15.11 revA (12) under a Windows control system and is supplied with four configured gas box lines.This tool combines high beam current at conventional energies with genuine high energy operation up to 780 keV, making it suited to deep well, retrograde well, and high energy device applications. It carries a strong package of installed productivity and process assurance options.Key specificationsPlatform: Varian E500 EHPI (EHPi-500), S/N ES193828Wafer sizes supported: 100mm, 125mm, 150mm, 200mmSoftware: 15.11 revA (12), Windows Control SystemEnergy range: standard operation through to high energy operation, 520 to 780 keVMaximum end station beam current (EHPi-500): up to 3300 µA (31P+), 2800 µA (75As+), 2000 µA (11B+/BF2+)Dose range: 1E11 to 1E16 ions/cm²Uniformity: 1σ ≤ 0.5%Repeatability: 1σ ≤ 0.5% (wafer to wafer)Beam parallelism: ≤0.5° (40 to 250 keV, drift or accel)Ion mass resolution: M/ΔM > 85 FWHMProcess angles: tilt 0 to 60° (±1°), orientation 0 to 360° (±2°)Throughput: 200mm at 210 wafers per hour (mechanical limit, 6 scans)Wafer breakage: MWBB ≤ 1:40,000Particulate control: ≤0.1 particles/cm² added at ≥0.16µmGas box configurationLine 1: SDS AsH3Line 2: SDS PH3Line 3: SDS BF3Line 4: ArgonInstalled optionsBeam Purity Check, Configuration Upload to Host, Productivity Plus (PP+), Remote Recipe Editor, Beam Drift Monitor, LX Productivity, Tilt Angle Assurance, Windows Control System, and Roplat Rotation Verification Interlock.Facilities (summary)75 kVA, 120/208V, 3 phase power (typical load 45 kVA); cooling water 60 to 150 PSIG; dry nitrogen and compressed air supply required. Footprint 96" H x 127.64" W x 197.33" D, weight 36,737 lbs (16,664 kg). Full facilities schedule available on request.
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